The overlay or multi - exposure in deep X - ray lithography could be well solved using the mask.

采用该掩模,可进一步解决深 X 射线光刻中的重复对准多次曝光问题.

互联网

The fabrication procedure of the mask and results of the deep X - ray lithography are given.

给出了该掩模设计制作工艺过程及深 X 射线光刻结果.

互联网